Date

Place

[P2-15]
14:00 ~ 15:30
Title:Effects of Negatively Charged Energy-Beam-Irradiation on a-IGZO Film
Y. J. Yoon, H. J. Seo (KICET, Korea), J. S. Oh, and Y. H. Kim (Infovion Inc., Korea)
Abstract: In this work, an irradiation process of negatively charged energy beam during the growth of a-IGZO thin-film using a conventional RF sputtering system was developed to improve the stability of OTFTs. Electron gun module with 60 mm diameter was attached in the sputtering system and the circular electron beam could be irradiated to the substrate varying the energy from 0.1 kV to 5 kV. Negatively charged energy beam was mainly composed of electron and O- ion and those were generated by?argon plasma including?oxygen gas. After the irradiation of negatively charged electron and oxygen beam, the microstructure and the composition of IGZO films were controlled depending on the beam energy and the quantity of oxygen. The effects of electron and negative oxygen ion irradiation were investigated in detail by evaluating the characteristics of a-IGZO-based TFTs.
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