Date

Place

[P2-106]
14:00 ~ 15:30
Title:Characteristics of Parylene Film Deposited with a Fast Deposition Rate
Jae-Hyun Lee and Hae-Jung Kim (Hanbat Nat'l Univ., Korea)
Abstract: Parylene (poly(p-xylylene)) film has been widely applied for a conformal coating industry because the parylene film which is deposited by chemical vapor deposition process has no pin-hole or bubbles compared to the solution based polymer films. Recently, the parylene film have been applied in the organic light emitting diodes industry by various applications such as a thin flexible substrate, flattening layer on rough substrate or organic layers for thin film encapsulation. To fabricate the parylene film in a micro-scale thickness, however, deposition process of parylene needs long tack time due to the slow deposition rate of 10-30 nm/min.In this study, we present the optical and physical characteristics of parylene films which are deposited by an ultra-fast deposition rate of 500 nm/min. These parylene films show the optical properties of high trasmittance over 90% in the visible range and low haze below than 5%. Based on the FT-IR measurement, parylene film deposited with a fast process shows the same characteristics with the parylene film deposited with the normal process. This means that the polymerization process of parylene monomers was successfully achieved at the ultra-fast deposition rate.
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